R. TETI (Sponsoring CIRP Fellow), University of Naples Federico II, Italy
G. CHRYSSOLOURIS (Sponsoring CIRP Fellow), University of Patras, Greece
E. ABELE, Technical University of Darmstadt, Germany
L. ALTING, Technical University of Denmark, Denmark
J. AURICH, University of Kaiserslautern, Germany
A. BERNARD, Ecole Centrale de Nantes, France
H. BLEY, Saarland University, Germany
D. BOUZAKIS, Aristoteles University Thessaloniki, Greece
G. BYRNE, University College Dublin, Ireland
L. CSER, Corvinus University of Budapest, Hungary
L. DE CHIFFRE, Technical University of Denmark, Denmark
M. COLLEDANI, Politecnico di Milano, Italy
B. DENKENA, Leibniz Universitaet Hannover, Germany
G. DINI, University of Pisa, Italy
D.A. DORNFELD, University of California, Berkeley, USA
D. DRUMMER, FAU Erlangen-Nuremberg, Germany
N. DUFFIE, University of Wisconsin-Madison, USA
J. DUFLOU, Katholieke Universiteit Leuven, Belgium
D. DUMUR, Ecole Superieure d’Electricite, France
H. ELMARAGHY, University of Windsor, Canada
W. ELMARAGHY, University of Windsor, Canada
E. FERRARIS, Katholieke Universiteit of Leuven, Belgium
A. FISCHER, TECHNION, Israel
L. FRATINI, University of Palermo, Italy
L. GALANTUCCI, Politecnico di Bari, Italy
M. GEIGER, University of Erlangen-Nürnberg, Germany
S. HINDUJA, University of Manchester, UK
I. INASAKI, Chubu University, Japan
I.S. JAWAHIR, University of Kentucky, USA
J. JEDRZEJEWSKI, Wroclaw Technical University, Poland
K. JEMIELNIAK, Warsaw University of Technology, Poland
F. JOVANE, Politecnico di Milano, Italy
Z. KATZ, University of Johannesburg, South Africa
F. KIMURA, Hosei University, Japan
T. KJELLBERG, Royal Institute of Technology, Sweden
F. KLOCKE, WZL, Aachen University, Germany
Y. KOREN, University of Michigan, USA
B. KRUSZYNSKI, Technical University of Lodz, Poland
S. KUMARA, Pennsylvania State University, USA
L. LAPERRIERE, Université du Quebec à Trois Rivières, Canada
B. LAUWERS, Katholieke University Leuven, Belgium
R. LEVI, Politecnico di Torino, Italy
G. LEVY, Inspire AG, Switzerland
T.K. LIEN, Norwegian University of Science and Technology, Norway
P. LONARDO, University of Genoa, Italy
S. LU, Univ. of Southern California, Los Angeles, USA
V. MAJSTOROVIC, University of Belgrad, Serbia
S. MAKRIS, University of Patras, Greece
P. MAROPOULOS, University of Bath, UK
P. MINETOLA, Politecnico di Torino, Italy
H. MEIER, University of Bochum, Germany
F. MICARI, University of Palermo, Italy
L. MONOSTORI, Hungarian Academy of Sciences, Hungary
M. MORI, Mori Seiki Co., Aichi, Japan
D. MOURTZIS, University of Patras, Greece
A. NEE, National University of Singapore, Singapore
R. NEUGEBAUER, Fraunhofer-Gesellsschaft, Munich, Germany
K.P. RAJURKAR, University of Nebraska-Lincoln, USA
G. REINHART, Technical University of Munich, Germany
R. ROY, Cranfield University, UK
M. SANTOCHI, University of Pisa, Italy
B. SCHOLZ-REITER, University of Bremen, Germany
G. SCHUH, WZL RWTH Aachen University, Germany
G. SELIGER, Fraunhofer-Berlin, Germany
D. SPATH, Fh-IAO, Stuttgart, Germany
N.P. SUH, KAIST, Korea
J. SUTHERLAND, Purdue University, USA
T. TOLIO, ITIA-CNR, Italy
T. TOMIYAMA, Cranfield University, UK
H.K. TÖNSHOFF, University of Hannover, Germany
M. TSENG, Hong Kong University of Science and Technology, Hong Kong
K. UEDA, Advanced Industrial Science & Technology, Japan
E. UHLMANN, Technical University Berlin, Germany
M. URGO, Politecnico di Milano, Italy
H. VAN BRUSSEL, Katholieke Univ. Leuven, Belgium
F. VAN HOUTEN, University of Twente, Netherlands
J. VANCZA, Hungarian Academy of Sciences, Hungary
R. VECCHIONE, CRIB Italian Institute of Technology, Italy
R. WERTHEIM, Fraunhofer IWU, Germany
E. WESTKAEMPER, University of Stuttgart, Germany
H.P. WIENDAHL, University of Hannover, Germany
W. WITS, University of Twente, Netherlands