by Ahmad Farooq, Wei Wang, Wei Zhang and Qi Zhang
This article reviews some of the most popular Silicon nanosphere (SiNP) production processes that are being carried out in the modern industry. The emphasis is primarily given on non-traditional production approaches of SiNP using spark erosion and along with that a potential novel method called High pressure flushing spark erosion (HPFSE) has been introduced in this paper. HPFSE utilizes deionized water sprayed at 0.8MPa through a rotating copper tool sinking on boron doped silicon ingot workpiece (WP), producing SiNP that comprises an average diameter of 50nm. The approximate productivity was 1.5g/hr after purification.